This is a 15-minute delayed claim to ensure its accuracy and reliability, and it is not responsible for any loss or damage caused by any delay or omission (regardless of whether tort liability or liability under the law or liability for breach of contract) or other liabilities)
Low silicon material requirement, proprietary seed crystal recycling technology and utilization various of large-size seed crystal
Based on the same technology used for cast polycrystalline, with enhanced equipment modification, monocrystalline is grew via directional solidification process
Effectively control structural impurities and dislocations via brand new thermal field design and seed crystal splicing technology
Average conversion efficiency managed within 0.3%-0.5% compared to that of monocrystalline produced via Czochralski method
Product | Specification | Saw Mark | Total Thickness Variation | Warp | Mono Grain Ratio | Verticality of Side |
---|---|---|---|---|---|---|
N-type Cast-mono crystalline silicon series | 158.75±0.25mm | ≤15um | ≤27um | ≤50um | ≥99% | 90°±0.25° |
166±0.25mm | ||||||
182±0.25mm | ||||||
210±0.25mm |